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Factors controlling

Chengkun WANG, Xiaojian ZHANG, Chao CHEN, Jun WANG

《环境科学与工程前沿（英文）》 2013年 第7卷 第2期   页码 151-157 doi: 10.1007/s11783-013-0482-7

摘要： The formation of cancinogenic nitrosamines, esp. -nitrosodimethylamine (NDMA) in water and wastewater treatment plants has drawn much attention in recent years. Dissolved organic matter from the transported Luan River water as water source of Tianjin was fractionated with different XAD resins and a series of ultra-filtration membranes with molecular weight (MW) cut-offs of 5k Da, 3k Da, and 1k Da, respectively. The NDMA yields from the raw water and each fraction were measured to investigate their role in NDMA yield. Results indicated that the hydrophilic fraction had a higher NDMA yield than those of hydrophobic fraction and transphilic fraction. The fraction with MW below 1k Da had a higher NDMA yield than that with larger MW. NDMA formation increased as the dissolved organic carbon (DOC) to dissolved organic nitrogen (DON) ratio decreased, which indicated that DON might serve as the real important precursor for NDMA. The correlation between NDMA yield and specific ultraviolet absorbance at 254 nm (SUVA ) suggested that the latter might not represent the specific precursors for NDMA in the water. Besides the water quality, the influences of pH, disinfectant dosage, and disinfection contact time on the formation of NDMA were also examined. These results will help water treatment plants establish measures to control this harmful disinfection by-product.

关键词： N-nitrosodimethylamine (NDMA)     disinfection by-product     dissolved organic nitrogen (DOC)     hydrophilic     molecular weight (MW)     specific ultraviolet absorbance at 254 nm (SUVA254)    

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Ultraviolet exposure enhanced silicon direct bonding

Guanglan LIAO, Xuekun ZHANG, Xiaohui LIN, Canghai MA, Lei NIE, Tielin SHI,

《机械工程前沿（英文）》 2010年 第5卷 第1期   页码 87-92 doi: 10.1007/s11465-009-0078-x

摘要： Ultraviolet (UV) exposure, as an additional technique following the traditional wet chemical activation processes, is applied to enhance hydrophilic silicon direct bonding. The effects of UV exposure on silicon wafers’ nano-topography and bonding strength are studied. It is found that the surface roughness of silicon wafers initially decreases and then increases with UV exposure time, and the bonding strength increases and then decreases accordingly. The correlations of annealing temperature and annealing time vs. bonding strength are experimentally explored. Results indicate that the bonding strength increases sharply then gently with increasing annealing temperature and annealing time using UV exposure. Besides, the reliability of silicon direct bonding with UV exposure enhancement after the high/low temperature cycle test, constant temperature and humidity test, vibration test and shock test is investigated. It follows from the results that the bonding strength of silicon wafer pairs with UV exposure decreases after the environmental tests, whereas the residual strength is still higher than that without UV exposure, and the variation trends of bonding strength vs. UV exposure time, annealing temperature and annealing time remain unchanged. Therefore, following the traditional wet chemical activation processes, appropriate UV exposure (about three minutes in this study) is effective and promising to enhance silicon direct bonding.

关键词： ultraviolet (UV) exposure     silicon direct bonding     bonding strength     reliability    

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Erratum to: Folded down-conversion mixer for a 60 GHz receiver architecture in 65-nm CMOS technology

Najam Muhammad AMIN,Zhi-gong WANG,Zhi-qun LI

《信息与电子工程前沿（英文）》 2015年 第16卷 第5期 doi: 10.1631/FITEE.14e0087

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Patterned wafer bonding using ultraviolet adhesive

Rui ZHUO, Guanglan LIAO, Wenliang LIU, Lei NIE, Tielin SHI

《机械工程前沿（英文）》 2011年 第6卷 第2期   页码 214-218 doi: 10.1007/s11465-011-0130-5

摘要：

The process of patterned wafer bonding using ultraviolet (UV) adhesive as the intermediate layer was studied. By presetting the UV adhesive guide-layer, controlling the thickness of the intermediate layer (1– 1.5 μm), appropriate pre-drying temperature (60°C), and predrying time (6 min), we obtained the intermediate layer bonding of patterned quartz/quartz. Experimental results indicate that patterned wafer bonding using UV adhesive is achieved under room temperature. The process also has advantages of easy operation, low cost, and no plugging or leakage in the patterned area after bonding. Using the process, a microfluidic chip for red blood cell counting was designed and fabricated. Patterned wafer bonding using UV adhesive will have great potential in the fabrication of microfluidic chips.

关键词： ultraviolet (UV) adhesive     intermediate layer     patterned wafer bonding    

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A spectrometer for measuring particle size distributions in the range of 3 nm to 10 μm

Jieqiong LIU,Jingkun JIANG,Qiang ZHANG,Jianguo DENG,Jiming HAO

《环境科学与工程前沿（英文）》 2016年 第10卷 第1期   页码 63-72 doi: 10.1007/s11783-014-0754-x

摘要： A spectrometer combining electrical mobility sizing and aerodynamic sizing was developed to measure aerosol size distributions in the range of 3 nm to 10 μm. It includes three instruments which cover different size ranges (a nano scanning mobility particle sizer (NSMPS, 3 – 60 nm), a regular scanning mobility particle sizer (RSMPS, 40 – 700 nm), and an aerodynamic particle sizer (APS, 550 nm – 10 μm)). High voltage and sheath flow of the NSMPS and RSMPS were supplied using two home-built control boxes. A LabVIEW program was developed for spectrometer automatic operation. A linear inversion method was applied to correct particle multiple charging effects and to integrate data from the three instruments into a wide-range size distribution. Experiments were conducted to compare distributions in the overlap size ranges measured by three instruments. Good agreement between the NSMPS and RSMPS was achieved after correcting for the difference in counting efficiencies of the two particle counters. Aerodynamic size distributions reported by the APS were converted to mobility size distributions by applying an effective density method. Distributions measured by the RSMPS and APS were consistent in the overlap size range of 550 – 700 nm. A full spectrum in the size range of 3 nm to 10 μm was demonstrated by measuring aerosol generated using a mixture of different sized polystyrene latex spheres.

关键词： spectrometer     particle size distribution     electrical mobility     linear inversion     aerodynamic diameter    

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Effects of design parameters on performance and cost analysis of combined ultraviolet-biofilter systems

Can WANG, Jinying XI, Hongying HU, Insun KANG

《环境科学与工程前沿（英文）》 2012年 第6卷 第4期   页码 588-594 doi: 10.1007/s11783-012-0433-8

摘要： A conceptual mathematical model was used to evaluate the design parameters of a combined ultraviolet (UV)-biofilter system, and perform a cost analysis. Results showed that the UV light source strength and the gas residence times in the UV system (UVRT) and biofilter (EBRT) had positive effects on the overall chlorobenzene removal efficiency of the system. High ratio of UVRT to EBRT improved the removal efficiency, suggesting that the UV system has a greater effect on the overall performance of the system compared with the biofilter. Analysis of the capital and operating costs showed that the capital costs of the standalone biofilter system were much higher than those of the standalone UV system. However, the biofilter operating costs were lower than those of the UV system. The operating costs of the combined UV-biofilter system increased with increasing UVRT/EBRT ratio, whereas its capital costs decreased.

关键词： volatile organic compounds     ultraviolet (UV) photodegradation     biofilter     modeling     cost analysis    

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Effect of ultraviolet irradiation and chlorination on ampicillin-resistant

Yuchen PANG,Jingjing HUANG,Jinying XI,Hongying HU,Yun ZHU

《环境科学与工程前沿（英文）》 2016年 第10卷 第3期   页码 522-530 doi: 10.1007/s11783-015-0779-9

摘要： Antibiotic resistance is a serious public health risk that may spread via potable and reclaimed water. Effective disinfection is important for inactivation of antibiotic-resistant bacteria and disruption of antibiotic resistance genes. Ampicillin is a widely prescribed antibiotic but its effectiveness is increasingly undermined by resistance. In this study, changes in ampicillin resistance for ( ) CGMCC 1.1595 were analyzed after exposure to different doses of ultraviolet (UV) or chlorine, and damage incurred by the plasmid encoding ampicillin resistance gene was assessed. We reported a greater stability in ampicillin-resistant CGMCC 1.1595 after UV irradiation or chlorination when compared with previously published data for other strains. UV irradiation and chlorination led to a shift in the mortality frequency distributions of ampicillin-resistant when subsequently exposed to ampicillin. The ampicillin hemi-inhibitory concentration (IC ) without disinfection was 3800 mg·L , and an increment was observed after UV irradiation or chlorination. The IC of ampicillin-resistant was 1.5-fold higher at a UV dose of 40 mJ·cm , and was 1.4-fold higher when exposed to 2.0 mg·L chlorine. These results indicate that UV irradiation and chlorination can potentially increase the risk of selection for strains with high ampicillin resistance. There was no evident damage to after 1–10 mg Cl ·L chlorination, while a UV dose of 80 mJ·cm yielded a damage ratio for of approximately 1.2-log. Therefore, high UV doses are required for effective disruption of antibiotic resistance genes in bacteria.

关键词： antibiotic resistance     Escherichia coli     ampicillin resistance gene     ultraviolet irradiation     chlorination    

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Toward better understanding vacuum ultraviolet–iodide induced photolysis via hydrogen peroxide formation

《环境科学与工程前沿（英文）》 2022年 第16卷 第5期 doi: 10.1007/s11783-021-1489-0

摘要：

• UV/VUV/I– induces substantial H2O2 and IO3– formation, but UV/I– does not.

关键词： Vacuum ultraviolet     Hydrogen peroxide     Iodate     Hydroxyl radical     Redox transition    

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Experimental study on the temperature dependence of ultraviolet absorption cross-sections of sulfur dioxide

ZHANG Shiliang, ZHOU Jie, CHEN Xiaohu

《能源前沿（英文）》 2008年 第2卷 第2期   页码 183-186 doi: 10.1007/s11708-008-0025-2

摘要： The photoabsorption cross-sections of sulfur dioxide were measured in the spectral regions of 200–230 nm and 275–315 nm at 298–415 K, using a grating monochromator with a resolution of 0.2 nm. The discrete absorption cross-section is directly correlated with the number of quantum excited from the base state. The absorption cross-sections at the peaks of discrete bands decreased linearly with the increase of temperature, which corresponded to the decrease in the population of vibrational and rotational transitions from the base level to higher excitation levels. The absorption cross-section peaks decreased linearly when the temperature increased from 298 to 415 K, with relative drops of 74.0% and 75.8% at 200–230 nm and 275–315 nm, respectively. Another distinctive feature of sulfur dioxide absorption spectra in the above two spectral regions was the quasiperiodic structure of the absorption peaks, whose equal wavelength intervals were 1.53 nm and 1.95 nm, respectively. Red and blue shifts were not found at the absorption peak positions.
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Bacterial inactivation, DNA damage, and faster ATP degradation induced by ultraviolet disinfection

Chao Yang, Wenjun Sun, Xiuwei Ao

《环境科学与工程前沿（英文）》 2020年 第14卷 第1期 doi: 10.1007/s11783-019-1192-6

摘要： • Long amplicon is more effective to test DNA damage induced by UV. • ATP in bacteria does not degrade instantly but does eventually after UV exposure. • After medium pressure UV exposure, ATP degraded faster. The efficacy of ultraviolet (UV) disinfection has been validated in numerous studies by using culture-based methods. However, the discovery of viable but non-culturable bacteria has necessitated the investigation of UV disinfection based on bacterial viability parameters. We used quantitative polymerase chain reaction (qPCR) to investigate DNA damage and evaluated adenosine triphosphate (ATP) to indicate bacterial viability. The results of qPCR effectively showed the DNA damage induced by UV when using longer gene amplicons, in that sufficiently long amplicons of both 16S and gadA indicated that the UV induced DNA damages. The copy concentrations of the long amplicons of 16S and gadA decreased by 2.38 log/mL and 1.88 log/mL, respectively, after exposure to 40 mJ/cm2 low-pressure UV. After UV exposure, the ATP level in the bacteria did not decrease instantly. Instead it decreased gradually at a rate that was positively related to the UV fluence. For low-pressure UV, this rate of decrease was slow, but for medium pressure UV, this rate of decrease was relatively high when the UV fluence reached 40 mJ/cm2. At the same UV fluence, the ATP level in the bacteria decreased at a faster rate after exposure to medium-pressure UV.

关键词： UV disinfection     DNA damage     qPCR     ATP    

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Effect of the ultraviolet/chlorine process on microbial community structure, typical pathogens, and antibiotic

《环境科学与工程前沿（英文）》 2022年 第16卷 第8期 doi: 10.1007/s11783-022-1521-z

摘要：

• UV/chlorine can effectively remove VBNC pathogens, ARGs and MGEs in reclaimed water.

关键词： UV/chlorine process     Pathogen     Antibiotic resistance genes     High-throughput qPCR     Reclaimed water    

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Using mRNA to investigate the effect of low-pressure ultraviolet disinfection on the viability of

Chao Yang, Wenjun Sun, Xiuwei Ao

《环境科学与工程前沿（英文）》 2019年 第13卷 第2期 doi: 10.1007/s11783-019-1111-x

摘要：

UV can induce damages on mRNA consistently among different genes.

SOS response was more active after UV treatment.

Programmed cell death was not found to be more active after UV treatment.

关键词： UV disinfection     Viability     mRNA     SOS response     Programmed cell death    

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利用紫外线灭活新型冠状病毒

Dana Mackenzie

《工程（英文）》 2020年 第6卷 第8期   页码 851-853 doi: 10.1016/j.eng.2020.06.009

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Synthesis and ultraviolet/aggregation-induced emission investigation of novel tetraphenylvinyl hydrazone

《化学科学与工程前沿（英文）》 2023年 第17卷 第12期   页码 2061-2073 doi: 10.1007/s11705-023-2366-0

摘要： Herein, three novel tetraphenylethylene hydrazone chemosensors TC12, SC16, and TC16 are prepared for the selective detection of F−. Two NH and one C=N units are incorporated into the sensors for better colorimetric responses, whereas the tetraphenyl unit is in charge of the aggregation-induced emission effect. Among them, compounds SC16 and TC16 form stable gels with some organic solvents. All the tetrahydrofuran/H2O solutions of the three compounds exhibit aggregation-induced emission effect, whereby the fluorescence emission increases by varying degrees with the volume of poor solvent water. Moreover, good aggregation-induced emission effects are observed in the self-assembly of SC16 and TC16. As a sample chemosensor, TC12 in tetrahydrofuran responds to F− selectively with high sensitivity, with the colorimetric and fluorometric detection limits of 8.25 × 10−7 mol·L–1 and 2.69 × 10−7 mol·L–1, respectively. The reversible gel-sol-gel phase transition and color changes indicate that both SC16-dimethyl sulfoxide and TC16-ethyl acetate gels specifically respond to F– with good sensitivity. The detection results are well supported by ultraviolet-visible spectroscopy, fluorescent spectroscopy, and 1H nuclear magnetic resonance. More importantly, the driving forces of gelation are visually clarified through the single crystal X-ray analysis of compound TOMe.

关键词： organogelator     tetraphenylvinyldrazone     single crystal     aggregation-induced emission effect     ion sensing    

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Influence of sprinkler irrigation droplet diameter, application intensity and specific power on flower

Yisheng ZHANG, Delan ZHU

《农业科学与工程前沿（英文）》 2017年 第4卷 第2期   页码 165-171 doi: 10.15302/J-FASE-2017145

摘要： To determine the main parameters of droplet strike damage and avoid flower injury due to the unsuitable practices during sprinkler irrigation, an indoor experiment of irrigation droplet impact on cyclamen was conducted. The influences of different parameters such as droplet diameter, application intensity, specific power on flower strike damage was analyzed using Image Pro-Plus software to compute strike damage area and define damage level by sense-analysis. The results showed that a damage area of <1% represents a safe irrigation level, 1%–3% slight damage level, 3%–6% moderate damage level, and>6% heavy damage level. Equations of application intensity, specific power with sprinkler irrigation time and flower injury ratio were regressed against parameters which cause impact damages. The results indicated that specific power has a significant correlation with injury, and flower damage area increased as the increasing of the value of specific power for the same irrigation time. Application intensity was also correlated with injury when the droplet diameter was larger than 1 mm. When the duration of sprinkler irrigation was 1, 5 and 10 min, the threshold of impinging damage of application intensity was 25.30, 5.01 and 1.64 mm·h and the specific power was 0.467×10 , 9.340×10 and 3.110×10 W·m . These results provide a reference for determining the suitable values of sprinkler properties in operation design.

关键词： application intensity     damage     floriculture     flowers     specific power     sprinkler irrigation    

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标题 作者 时间 类型 操作

Factors controlling

Chengkun WANG, Xiaojian ZHANG, Chao CHEN, Jun WANG

期刊论文

Ultraviolet exposure enhanced silicon direct bonding

Guanglan LIAO, Xuekun ZHANG, Xiaohui LIN, Canghai MA, Lei NIE, Tielin SHI,

期刊论文

Erratum to: Folded down-conversion mixer for a 60 GHz receiver architecture in 65-nm CMOS technology

Najam Muhammad AMIN,Zhi-gong WANG,Zhi-qun LI

期刊论文

Patterned wafer bonding using ultraviolet adhesive

Rui ZHUO, Guanglan LIAO, Wenliang LIU, Lei NIE, Tielin SHI

期刊论文

A spectrometer for measuring particle size distributions in the range of 3 nm to 10 μm

Jieqiong LIU,Jingkun JIANG,Qiang ZHANG,Jianguo DENG,Jiming HAO

期刊论文

Effects of design parameters on performance and cost analysis of combined ultraviolet-biofilter systems

Can WANG, Jinying XI, Hongying HU, Insun KANG

期刊论文

Effect of ultraviolet irradiation and chlorination on ampicillin-resistant

Yuchen PANG,Jingjing HUANG,Jinying XI,Hongying HU,Yun ZHU

期刊论文

Toward better understanding vacuum ultraviolet–iodide induced photolysis via hydrogen peroxide formation

期刊论文

Experimental study on the temperature dependence of ultraviolet absorption cross-sections of sulfur dioxide

ZHANG Shiliang, ZHOU Jie, CHEN Xiaohu

期刊论文

Bacterial inactivation, DNA damage, and faster ATP degradation induced by ultraviolet disinfection

Chao Yang, Wenjun Sun, Xiuwei Ao

期刊论文

Effect of the ultraviolet/chlorine process on microbial community structure, typical pathogens, and antibiotic

期刊论文

Using mRNA to investigate the effect of low-pressure ultraviolet disinfection on the viability of

Chao Yang, Wenjun Sun, Xiuwei Ao

期刊论文

利用紫外线灭活新型冠状病毒

Dana Mackenzie

期刊论文

Synthesis and ultraviolet/aggregation-induced emission investigation of novel tetraphenylvinyl hydrazone

期刊论文

Influence of sprinkler irrigation droplet diameter, application intensity and specific power on flower

Yisheng ZHANG, Delan ZHU

期刊论文